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Review of Chemical Vapor Deposition of Graphene

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Graphene, the atomically thin sheet of sp2-hybridized carbon atoms arranged in honeycomb structure, since its debut in 2004, graphene has attracted enormous interest due to its unique physical, mechanical and electrical properties. Chemical vapor deposition, also known as CVD, is a chemical process used to produce high quality, high-performance graphene on a fairly large scale. With the ever-increasing demand for graphene by industrial and commercial companies, it’s no wonder that chemical vapor deposition has become a talking point for many manufacturers. The process is often used in the semiconductor industry to produce thin films.

Chemical vapor deposition (CVD) has emerged as the most popular method for the scalable production of large-area and high-quality graphene for various applications since the method was first reported in 2008/2009. The chemical vapor deposition growth of graphene is performed by depositing gaseous reactants onto a substrate. This process works by combining gas molecules (typically using carrier gases) inside of a reaction chamber, which is usually set at ambient temperature. When the gases come into contact with the substrate, a reaction occurs that creates a material film on the surface of the substrate.

The temperature of the substrate must be controlled exactly, since that determines the kind of reaction that will occur. Although this is a sensitive process, it can be done relatively quickly and on a large enough scale to make it viable for mass production. Among the different graphene synthesis methods, chemical vapor deposition of graphene on low cost copper foil shows great promise for large scale applications.

Microfabrication processes widely use chemical vapor deposition to deposit materials in various forms, including: monocrystalline, polycrystalline, amorphous, and epitaxial. These materials include: silicon (SiO2, germanium, carbide, nitride, oxynitride), carbon (fiber, nanofibers, nanotubes, diamond and graphene), fluorocarbons, filaments, tungsten, titanium nitride and various high-k dielectrics.

Furthermore, chemical vapor deposition graphene has been integrated with hexagonal boron nitride (hBN) and transition metal dichalcogenides (TMDCs) for the fabrication of van der Waals heterostructure for nanoelectronic, optoelectronic, energy devices, and other emerging technologies. chemical vapor deposition graphene has electronic properties that are potentially valuable in a number of applications. For example, few-layer graphene grown on Ni can function as flexible transparent conductive electrodes for organic photovoltaic cells. In addition, because we can synthesize large-grain graphene on Cu foil, such large-grain graphene has electronic properties suitable for use in field effect transistors.

CVD Graphene Applications:

CVD Graphene is used in light-emitting diodes.

CVD Graphene is used in photodetectors.

CVD Graphene is used in gas sensing technology.

CVD Graphene is used in solar cells.

CVD Graphene is used in water treatment.

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