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Iron Sputtering Targets

Iron Sputtering Targets

The Iron sputtering targets we are producing are used in PVD, CVD, and optical applications. These targets have a molecular weight of 55.85 g/mol. These sputtering targets appear as grey metal in nature. Sputtering targets are available as monoblock or bonded in thin films. Iron sputtering targets are also used in the latest process equipment which is a large area coating in solar energy and fuel cells. We produced targets for research purposes as well as custom sizes and alloys. Nickel sputtering targets have a melting point of 1535 °C and a boiling point of 2750 °C. These materials are produced using crystallization and other high purification processes like solid-state and sublimation. Iron is a very commonly used material with vast applications in tools, machines, and automobiles. It is also used commonly in the construction industry. We use ultra-high purification process to produce Iron sputtering targets which are ranging from 99% to 99.9999% pure.

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