Tantalum Sputtering Targets

Tantalum Sputtering Targets

Tantalum sputtering targets are used in a process where atoms are ejected from solid tantalum targets due to the bombardment of the highly energetic particles on the target. Tantalum is dark blue-gray in its appearance and it has high corrosion resistance. Tantalum does not easily react to chemicals below 150 C and only hydrofluoric acid can dissolve it. Among all metals, Tantalum has the fourth highest melting point and it can form very protective and very thin layers of oxide for high-quality capacitors. This property of Tantalum makes it extremely suitable material for sputtering targets. Tantalum sputtering targets are commonly used in manufacturing superalloys and electron-beam melting. Furthermore, it is used as a substitute for Platinum, as a superalloy additive in nickel-based alloys, and for sputtering targets in thin-film transistor liquid crystal display (TFT-LCD) and integrated circuits. We maintain high-quality standards to ensure that we provide highly pure Tantalum sputtering targets and our products pass through strict quality controls.

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