Titanium Boride Sputtering Targets

Titanium boride is a hexagonally structured compound with the chemical formula of TiB2. Its specifications include a molecular weight of 69.489, a melting point of approx. 2900 °C. Its density is 4.52 g/cm3. Thin films formed by this compound have several applications which include a protective coating on magnetic recording and cutting tools from corrosion. Titanium boride sputtering targets are obtained through many different techniques such as reactive sputtering, ion beam sputtering and pulsed laser sputtering. It is ideal for protective coatings due to low deposition temperature. The mechanical and tribological properties of deposited Titanium boride films have attracted the attention of researchers. It has so many uses and is available in different shapes and sizes. We provide low stress super hard Titanium Boride films to enhance the performance. It can only be achievable through controlled temperature and ion bombardment. Our comprehensive offering of ultra-high purity will make sure of your desired results