Nickel Oxide Sputtering Targets

Nickel Oxide Sputtering Targets

We produce and supply high purity nickel oxide sputtering targets with the smallest possible average grain size with a molecular weight of 74.69 g/mol. Its compound formula is NiO with the highest possible density of 6.67 g/cm3. The Monoisotopic Mass of Nickel oxide sputtering target is 73.9303. Its appearance is a green target with a melting point of 1955 °C (3551 °F). These targets are designed to work with both older sputtering devices as well as with the latest process equipment for large area coating in fuel cells, solar energy, and flip-chip applications. We produce custom sizes, alloys and research sized targets. We specialize in producing custom compositions for new proprietary technologies and commercial and research purposes. We cast any of the targets and most other advanced materials into a bar, rod, or plate form. Many other shapes we produce are oval, rectangle and cylindrical as well as custom shapes on request.

  • Product
  • Qty in Cart
  • Quantity
  • Price
  • Subtotal