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Prime Si + SiO2 (dry), 4”,(100), Boron Doped, 1 -10 (ohm.cm), 1-Side Polished, 525 ± 25 μm, Coating 100 nm

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Prime Si + SiO2 (dry), 4”,(100), Boron Doped, 1 -10 (ohm.cm), 1-Side Polished, 525 ± 25 μm, Coating 200 nm

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Prime Si + SiO2 (wet), 4”,(100), Boron Doped, 0.001 - 0.01 (ohm.cm), 1-Side Polished, 525 ± 25 μm, Coating 500 nm

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Prime Si + SiO2 (wet), 4”,(100), Boron Doped, 1 - 10 (ohm.cm), 1-Side Polished, 525 ± 25 μm, Coating 1500 nm

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Prime Si + SiO2 (wet), 4”,(100), Boron Doped, 1 - 10 (ohm.cm), 1-Side Polished, 525 ± 25 μm, Coating 300 nm

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Prime Si + SiO2 (wet), 4”,(100), Boron Doped, 1 - 10 (ohm.cm), 1-Side Polished, 525 ± 25 μm, Coating 400 nm

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Prime Si + SiO2 (wet), 4”,(100), Boron Doped, 1 -10 (ohm.cm), 2-Side Polished, 500 ± 15 μm, Coating 300 nm

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Prime Si + SiO2 (wet), 4”,(111), Phosphor Doped, 1 - 10 (ohm.cm), 1-Side Polished, 525 ± 25 μm, Coating 1000 nm

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