Ytterbium Oxide Sputtering Targets
We manufacture Ytterbium Oxide (Yb2O3) Sputtering Targets that have the highest possible density of 9200 kg/m3. The smallest average grain size of Ytterbium Oxide sputtering targets is 394.08 molecular weight. Ytterbium Oxide is commonly used in chemical vapor disposition, optical applications, semiconductors, and physical vapor deposition display. Our standard thin-film sputtering targets are available in monoblock and bonded. These targets have characteristics of brittleness and low thermal conductivity which are not amenable to sputtering conductivity. The appearance of Ytterbium Oxide is white in color and the melting point is 4,271°F (2,355°C). The shapes of Ytterbium Oxide Sputtering Targets that we can provide are, step targets, column targets, disc targets, plate targets, and custom-made. The size that are available are: for circular, diameter is less than 14inch and thickness greater than 1mm. The size for block is: length less than 32inch, width less than 12inch and thickness greater than 1mm.