Yttrium Ferrite Sputtering Targets
We have a specialty in the manufacturing of Ytterbium Ferrite (Y3Fe5O12) Sputtering Targets. We analyze all targets using the best techniques which include Inductively Coupled Plasma (ICP), Glow Discharge Mass Spectrometry (GDMS) X-Ray Fluorescence technique. We provide Ytterbium Ferrite sputtering targets with the smallest average grain size and highest possible density for use in chemical vapor deposition, physical vapor deposition display, semiconductors, and optical applications. Bonding is necessary and recommended for the sputtering of these targets. These materials have characteristics of brittleness and low thermal conductivity which are not amenable to sputtering conductivity. Our standard thin-film sputtering targets are available bonded and these targets are Indium and Elastomer type bonded. Its appearance is silvery solid and it is 2 inches in size. We can also provide custom targets in various sizes like an oval, annular or rectangular target. The shapes of targets can also be customized like a bar, rod or plate form and other shapes are available on request. We provide sputtering targets from 99% to 99.9999% pure.