Silicon Carbide Sputtering Targets

Silicon Carbide Sputtering Targets

Silicon Carbide is represented by the chemical formula of CSi and molecular weight of 40.1. These are colorless crystals with the melting point of 2,730° C (4,946° F) (decomposes). It is a semiconductor containing Silicon and Carbon, used as an abrasive. They have the power to endure stress. That is why their usage in car clutches, car brakes and ceramic plates in bulletproof vests is highly significant. Silicon carbide has intrinsic properties, for which Silicon Carbide Sputtering Targets are used in microelectronic and MEMS (Micro-Electro-Mechanical Systems) applications. They have low growth temperature, which ensures larger compatibility. The thin-film depositions are obtained by chemical vapor deposition (CVD) or physical vapor deposition (PVD) processes with modern technology. Sputtering Targets are available to deal with old equipment as well as new devices. All provisions are properly labeled and sent with good maintenance. Whether it is a small package or a bulk quantity, customers can rely on our excellent services.

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