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Tungsten Sputtering Targets

Tungsten Sputtering Targets

Tungsten Sputtering Targets consists of one of the densest elements which are also known as Wolfram. It is semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Sputtering Targets layers are composed of thin-film transistors specially used in TFT-LCD screens. It is also used wherever they form a large screen or particularly where there’s high image definition as well as when optimized contrast is needed. It uses crystallization of solid-state and other Ultra High purification processes such as sublimation. The chemical purity is crucial to any metal sputtering targets so the Tungsten Sputtering Targets offered by us is 99.9% pure. The melting point of the tungsten sputtering target is 5900 °C and it has a density of 19.3 g/cm3. The electrical resistivity of tungsten is 5.65 microhm-cm at 27°C with an electronegativity of 1.7 paulings. We also produce Tungsten in a variety of shapes required on demand.

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