Niobium Oxide Sputtering Targets

Niobium Oxide Sputtering Targets

Nb2O5 is the compound formula of Niobium Oxide with a molecular weight of these targets is 265.81 g/mol. We produce Niobium Oxide as pieces, tablets, powder, and pellets. We produced these targets with Mil-Spec, Reagent, Technical Grade; Agricultural and Pharmaceutical Grade; Optical grade and other applicable ASTM testing standards. Special custom packaging is also available by request. These targets have a melting point of 1512 °C (2754 °F) and the highest possible density of 4.47 g/cm3. Niobium oxide sputtering target has a monoisotopic mass of 265.787329 g/mol. These targets are available for use in physical vapor deposition (PVD) display, optical applications, semiconductors, and CVD. These targets are designed to work with both older as well as the latest processing equipment for flip-chip and fuel cell applications. These are also available in nanoparticles and in the form of organometallics and solutions. Niobium Oxide sputtering targets are available with 99.9% to 99.9999% purity.

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