Loading... Please wait...


our newsletter

Account Navigation

  • Gift Certificates
  • Wish Lists
  • My Account
  • Order Status


Lithium Cobalt Oxide Sputtering Targets and Applications

Posted by

Lithium cobalt oxide is a chemical compound with formula LiCoO2. Lithium cobalt oxide is a dark blue or bluish-gray crystalline solid and is commonly used in the positive electrodes of lithium-ion batteries.

Now let's see how lithium cobalt oxide sputtering targets can be used in batteries. Batteries with very small sizes are of immense interest, as the sizes of portable microelectronic devices and sensors decrease continuously. Thin film batteries can be used as power sources for various low power electronic devices such as portable electronic devices and micro electro mechanical systems (MEMS) which require very low power and current levels and hence can be powered by thin film batteries.

The major advantage of the thin film battery is that it can be fabricated by using the same techniques available in the microelectronic industries and can be directly incorporated with the devices because thin film battery can be deposited in any two dimensional shape or size according to the device requirement. In 1980 Mizushima proposed lithium cobalt oxide as the cathode material due to its high operating voltage and cycle life. Lithium cobalt oxide thin films have been deposited by several techniques such as pulsed laser deposition, solgel and rf sputtering. To see how rf sputtering can be done by using lithium cobalt oxides, you can click the link given below:


In battery applications magnetron sputter system can used used. The required thin film lithium can be generally deposited by conventional sputtering target techniques, whereby a LiCoO2 sputtering target assembly, defined as the LiCoO2 sputtering target bonded to a backing plate, can be used to deposit the required thin film lithium. With regards to sputtering targets to produce Li thin films, a D.C. (direct current) magnetron sputter system can be employed. The LixCoyO2 sputtering target is generally represented by the formula LiCoO2 and forms a part of a cathode assembly that, together with an anode, is placed in an evacuated chamber filled with an inert gas, preferably argon. Magnets are disposed above the LiCoO2 sputtering target, and a switch for connecting target backing plate to a D.C. voltage source. A substrate support is positioned below LiCoO2 sputter target within the chamber. In operation, a high voltage electrical field is applied across the cathode and the anode. The inert gas is ionized by collision with electrons ejected from the cathode. Positively charged gas ions are attracted to the cathode and, upon impingement with the target surface, these ions dislodge the target material. The dislodged target material traverses the evacuated enclosure and deposits as a LiCoO2 thin film on the desired substrate, which is normally located close to the anode.

If you need lithium cobalt oxide, you can give an order from the links given on the table below.

Type Size Thickness Purity Link
Lithium Cobalt Oxide 1' 0.125'' 99.9% https://nanografi.com/sputtering-targets/lithium-cobalt-oxide-licoo2-sputtering-targets-size-1-thickness-0-125-purity-99-9/
Lithium Cobalt Oxide 2' 0.125'' 99.9% https://nanografi.com/sputtering-targets/lithium-cobalt-oxide-licoo2-sputtering-targets-size-2-thickness-0-125-purity-99-9/
Lithium Cobalt Oxide 2' 0.250'' 99.9% https://nanografi.com/sputtering-targets/lithium-cobalt-oxide-licoo2-sputtering-targets-size-2-thickness-0-250-purity-99-9/
Lithium Cobalt Oxide 3' 0.125'' 99.9% https://nanografi.com/sputtering-targets/lithium-cobalt-oxide-licoo2-sputtering-targets-size-3-thickness-0-125-purity-99-9/
Lithium Cobalt Oxide 3' 0.250'' 99.9% https://nanografi.com/sputtering-targets/lithium-cobalt-oxide-licoo2-sputtering-targets-size-3-thickness-0-250-purity-99-9/
Lithium Cobalt Oxide 4' 0.125'' 99.9% https://nanografi.com/sputtering-targets/lithium-cobalt-oxide-licoo2-sputtering-targets-size-4-thickness-0-125-purity-99-9/
Lithium Cobalt Oxide 4' 0.250'' 99.9% https://nanografi.com/sputtering-targets/lithium-cobalt-oxide-licoo2-sputtering-targets-size-4-thickness-0-250-purity-99-9/
Lithium Cobalt Oxide (Indium) 2' 0.125'' 99.9% https://nanografi.com/sputtering-targets/lithium-cobalt-oxide-indium-licoo2-sputtering-targets-size-2-thickness-0-125-purity-99-9/
Lithium Cobalt Oxide (Indium) 3' 0.125'' 99.9% https://nanografi.com/sputtering-targets/lithium-cobalt-oxide-indium-licoo2-sputtering-targets-size-3-thickness-0-125-purity-99-9/
Lithium Cobalt Oxide (Indium) 4' 0.125'' 99.9% https://nanografi.com/sputtering-targets/lithium-cobalt-oxide-indium-licoo2-sputtering-targets-size-4-thickness-0-125-purity-99-9/
Lithium Nickel Cobalt Oxide 2' 0.125'' 99.9% https://nanografi.com/sputtering-targets/lithium-nickel-cobalt-oxide-lini-1-x-coxo2-sputtering-targets-size-2-thickness-0-125-purity-99-9/
Lithium Nickel Cobalt Oxide 2' 0.250'' 99.9% https://nanografi.com/sputtering-targets/lithium-nickel-cobalt-oxide-lini-1-x-coxo2-sputtering-targets-size-2-thickness-0-250-purity-99-9/

Lanthanum Nickel Oxide Sputtering Targets and Applications

Lanthanum nickel oxide with the chemical formula of LaNiO3 is an important perovskite-type oxide with metallic conductivity.Lanthanum nickel oxide is a ternary compound with unique chemical and physical properties. It shows an extended range of oxygen-deficient compositions, an uncommon intrinsic n-type metallic conductance, a perovskite crystal structure and thermal and chemical stability. These characteristics make LNO a technologically important perovskite oxide electrode [...]

Read More »

Lead Zirconium Titanate Sputtering Targets and Applications

Lead zirconium titanate is an inorganic compound. It is a ceramic perovskite material that shows a marked piezoelectric effect, meaning that the compound changes shape when an electric field is applied. Lead zirconium titanate is used in a number of practical applications such as ultrasonic transducers and piezoelectric resonators.Lead zirconium titanate was first developed around 1952 at the Tokyo Institute of Technology. [...]

Read More »

Erbium Oxide Sputtering Targets and Applications

Erbium oxide with a chemical formula of Er2O3 is an oxide of erbium metal.The applications of erbium oxide are varied due to their electrical, optical and photoluminescence properties. Nanoscale materials doped with Er+3 are of much interest because they have special particle-size-dependent optical and electrical properties. Erbium oxide doped nanoparticle materials can be dispersed in glass or plastic for display purposes, such [...]

Read More »

Cobalt Sputtering Targets

Cobalt is a chemical element with symbol Co and atomic number 27. Cobalt is a hard, lustrous, silver-gray metal.Cobalt is used in the preparation of wear-resistant, high-strength alloys and cobalt is widely used in magnetic recording because it is only one of the three room temperature ferromagnets that has unaxial symmetry and therefore can be used in digital recording. Cobalt makes alloys [...]

Read More »

Cerium Oxide Sputtering Targets and Applications

Cerium is a member of the lanthanide series of metals and is the most abundant amongst the rare-earth elements in the earth’s crust.Cerium oxide can be useful in various optical and electronic applications because of its high refractive index and its dielectric constant.Also, for corrosion protective coatings cerium oxide can be chosen instead of chromate based coatings. You may reach out [...]

Read More »

Chromium Oxide Sputtering Targets and Applications

Chromium oxide is the inorganic compound of the formula Cr2O3. Chromium oxide sputtering targets are used in many applications. Not let’s look at some examples where chromium oxide sputtering targets are used.Cr2O3 thin films exhibit high hardness values and low friction coefficients. These properties make chromium oxide a serious candidate to replace transition metal nitrides or Al2O3 in special applications. You [...]

Read More »

Chromium Sputtering Targets and Applications

Chromium is a silvery, lustrous, hard, and brittle metal known for its high mirror polish and corrosion resistance.Chromium sputtering targets find a large usage area in automobile industry. To form a shiny coating found on wheels and bumpers chromium sputtering targets are good materials. In many vacuum applications like automotive glass coatings chromium sputtering targets can be used. Chromium has high resistance [...]

Read More »

Cobalt Iron Boron Sputtering Targets and Applications

Cobalt, iron and boron get together to form an alloy and this alloy can be used as a sputtering target. Let’s look at the applications that cobalt, iron and boron alloy can be used.Boron alloy with transition metals like cobalt iron boron have many attractive properties, including high melting point and hardness, good wear and corrosion resistance, excellent electrical [...]

Read More »

Barium Sputtering Targets and Applications

Barium with the atomic symbol of Ba and atomic number of 56 is a Block S, Group 2, Period 6 element with an atomic weight of 137.27. Barium is a member of the alkaline-earth metals.Barium sputtering targets can be for plating of electronic devices. Barium has good electrical properties and these properties make it useful for sputtering applications. For semiconductors barium [...]

Read More »

Back to Top