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Lithium Cobalt Oxide Sputtering Targets and Applications

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Lithium cobalt oxide is a chemical compound with formula LiCoO2. Lithium cobalt oxide is a dark blue or bluish-gray crystalline solid and is commonly used in the positive electrodes of lithium-ion batteries.

Now let's see how lithium cobalt oxide sputtering targets can be used in batteries. Batteries with very small sizes are of immense interest, as the sizes of portable microelectronic devices and sensors decrease continuously. Thin film batteries can be used as power sources for various low power electronic devices such as portable electronic devices and micro electro mechanical systems (MEMS) which require very low power and current levels and hence can be powered by thin film batteries.

The major advantage of the thin film battery is that it can be fabricated by using the same techniques available in the microelectronic industries and can be directly incorporated with the devices because thin film battery can be deposited in any two dimensional shape or size according to the device requirement. In 1980 Mizushima proposed lithium cobalt oxide as the cathode material due to its high operating voltage and cycle life. Lithium cobalt oxide thin films have been deposited by several techniques such as pulsed laser deposition, solgel and rf sputtering. To see how rf sputtering can be done by using lithium cobalt oxides, you can click the link given below:

https://core.ac.uk/download/pdf/50694180.pdf

In battery applications magnetron sputter system can used used. The required thin film lithium can be generally deposited by conventional sputtering target techniques, whereby a LiCoO2 sputtering target assembly, defined as the LiCoO2 sputtering target bonded to a backing plate, can be used to deposit the required thin film lithium. With regards to sputtering targets to produce Li thin films, a D.C. (direct current) magnetron sputter system can be employed. The LixCoyO2 sputtering target is generally represented by the formula LiCoO2 and forms a part of a cathode assembly that, together with an anode, is placed in an evacuated chamber filled with an inert gas, preferably argon. Magnets are disposed above the LiCoO2 sputtering target, and a switch for connecting target backing plate to a D.C. voltage source. A substrate support is positioned below LiCoO2 sputter target within the chamber. In operation, a high voltage electrical field is applied across the cathode and the anode. The inert gas is ionized by collision with electrons ejected from the cathode. Positively charged gas ions are attracted to the cathode and, upon impingement with the target surface, these ions dislodge the target material. The dislodged target material traverses the evacuated enclosure and deposits as a LiCoO2 thin film on the desired substrate, which is normally located close to the anode.

If you need lithium cobalt oxide, you can give an order from the links given on the table below.

Type Size Thickness Purity Link
Lithium Cobalt Oxide 1' 0.125'' 99.9% https://nanografi.com/sputtering-targets/lithium-cobalt-oxide-licoo2-sputtering-targets-size-1-thickness-0-125-purity-99-9/
Lithium Cobalt Oxide 2' 0.125'' 99.9% https://nanografi.com/sputtering-targets/lithium-cobalt-oxide-licoo2-sputtering-targets-size-2-thickness-0-125-purity-99-9/
Lithium Cobalt Oxide 2' 0.250'' 99.9% https://nanografi.com/sputtering-targets/lithium-cobalt-oxide-licoo2-sputtering-targets-size-2-thickness-0-250-purity-99-9/
Lithium Cobalt Oxide 3' 0.125'' 99.9% https://nanografi.com/sputtering-targets/lithium-cobalt-oxide-licoo2-sputtering-targets-size-3-thickness-0-125-purity-99-9/
Lithium Cobalt Oxide 3' 0.250'' 99.9% https://nanografi.com/sputtering-targets/lithium-cobalt-oxide-licoo2-sputtering-targets-size-3-thickness-0-250-purity-99-9/
Lithium Cobalt Oxide 4' 0.125'' 99.9% https://nanografi.com/sputtering-targets/lithium-cobalt-oxide-licoo2-sputtering-targets-size-4-thickness-0-125-purity-99-9/
Lithium Cobalt Oxide 4' 0.250'' 99.9% https://nanografi.com/sputtering-targets/lithium-cobalt-oxide-licoo2-sputtering-targets-size-4-thickness-0-250-purity-99-9/
Lithium Cobalt Oxide (Indium) 2' 0.125'' 99.9% https://nanografi.com/sputtering-targets/lithium-cobalt-oxide-indium-licoo2-sputtering-targets-size-2-thickness-0-125-purity-99-9/
Lithium Cobalt Oxide (Indium) 3' 0.125'' 99.9% https://nanografi.com/sputtering-targets/lithium-cobalt-oxide-indium-licoo2-sputtering-targets-size-3-thickness-0-125-purity-99-9/
Lithium Cobalt Oxide (Indium) 4' 0.125'' 99.9% https://nanografi.com/sputtering-targets/lithium-cobalt-oxide-indium-licoo2-sputtering-targets-size-4-thickness-0-125-purity-99-9/
Lithium Nickel Cobalt Oxide 2' 0.125'' 99.9% https://nanografi.com/sputtering-targets/lithium-nickel-cobalt-oxide-lini-1-x-coxo2-sputtering-targets-size-2-thickness-0-125-purity-99-9/
Lithium Nickel Cobalt Oxide 2' 0.250'' 99.9% https://nanografi.com/sputtering-targets/lithium-nickel-cobalt-oxide-lini-1-x-coxo2-sputtering-targets-size-2-thickness-0-250-purity-99-9/

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