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Manganese Sputtering Targets

Manganese Sputtering Targets

Manganese sputtering target is a silvery-metallic in appearance with a molecular weight of 54.94. Its density is 7.21-7.44 g/cm3 and it has an electrical resistivity of 185.0 microhm-cm @ 25 °C. Manganese sputtering target is not soluble in water and its heat of vaporization is 53.7 K-Cal/gm atom at 1962°C. We utilize cutting edge technology to produce high-quality Manganese sputtering targets that are available in custom dimensions. The Manganese sputtering targets are commonly used for high tech equipment and semiconductors. Manganese sputtering lets thin film deposition of high purity manganese on the other solid substrate by the transformation and controlled removal of the target material into a directed plasma/gaseous phase. Each target is custom made to fit the customer specified backing cups or plates with either tin/indium or silver epoxy bonding. We clean the targets for use in vacuum and they are packaged with care to avoid infiltration of foreign material.

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