Nickel Sputtering Targets
The nickel sputtering targets we are producing are used in PVD, CVD and optical applications. These targets have a density of 8.902 g/cm3 and its molecular weight is 58.69 g/mol. These sputtering targets appear as Lustrous silvery metal in nature. Sputtering targets are available as monoblock or bonded in thin films. Nickel sputtering targets are also used in the latest process equipment which is a large area coating in solar energy and fuel cells. We produce targets for research purposes as well as custom sizes and alloys. Shapes can be available by request as we produce Nickel in rods, plates and powdered form by default. Nickel sputtering targets have a melting point of 1455 °C and a boiling point of 2732 °C. These materials are produced using crystallization and other high purification processes like solid-state and sublimation. These sputtering targets have Electrical Resistivity of 69.3 nΩ.m at 20 °C and electronegativity of 1.91 Paulings.