Nickel Vanadium Sputtering Targets

Nickel Vanadium Sputtering Targets

The appearance of nickel vanadium sputtering targets is metallic in nature. The compound formula of Nickel Vanadium is NiV with a molecular weight of 109.63. The films which are obtained by nickel vanadium sputtering targets can be used in adhesion layers to support flip chips. Films of thin nickel vanadium sputtering targets obtained can also be used as barriers for protecting metal corrosions for the solar absorber aluminum substrate. These targets have a melting point of 1775-1875 °C and they are insoluble in water. We analyze these sputtering targets using best-demonstrated techniques including XRF, Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma. In this process of Sputtering which includes deposition of a thin film with a high purity sputtering metallic is poured in another substrate by the controlled removal and conversion of the target material into a gaseous or plasma phase through the bombardment of ions. With a Monoisotopic Mass of 108.879 g/mol, we provide Nickel Vanadium Sputtering Targets ranging from 99.9% to 99.9999% pure.

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