Tin Oxide Sputtering Targets

Tin Oxide Sputtering Targets

Tin oxide, also known as stannic oxide, is the inorganic compound with the chemical formula of SnO2. The mineral form of tin oxide is called as cassiterite, and this is the main ore of tin. It is a colourless, diamagnetic, amphoteric solid. Now let's look at how tin oxide sputtering targets can be used.

The use of low-emissivity or energy saving glass has become very popular in the modern day building design. This energy saving property is achieved by applying a thin metal oxide coating on one side of the glass. Materials used for the coating are indium tin oxide, zinc oxide doped with aluminum and tin oxide. Among those, tin oxide is the cheapest and cost efficient material. Typically, tin oxide is a transparent n-type semiconductor. Tin oxide thin film has low electrical resistance and high optical transparency in the visible range of the electromagnetic spectrum. Over past decades, tin oxide thin film has been widely investigated owing to its good optical and electrical properties. Energy saving glass with tin oxide coated thin film has the ability of rejects the heat from outside at summer while kept warmer at the winter.

Tin oxide thin films deposited using rf magnetron sputtering is the most attractive deposition technique from the industrial point of view. This is because of its high deposition rate, good reproducibility and applicable for large-scale deposition system. Depending on the deposition parameters and the chamber environments, different structured of tin oxide will take shape and it will affect the properties of tin oxide thin films.

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