Tin Oxide Sputtering Targets

Tin Oxide Sputtering Targets

Tin oxide sputtering targets are made with raw materials of high quality. They are analyzed and manufactured in selected labs with great caution and care, to produce it in the purest form with a high density of approximately 6.45 g/cm3. It can be used in different applications of touch panels and displays. Its most efficient use in TFT- LCD, OLEDs, and PDPs put forward remarkable achievements. However, Tin oxide sputtering targets are also offered in different sizes and packages from standard to custom based, and from personal research to industrial use. Its usage and quantity are applicable and available to customers' needs. Tin Oxide (SnO) creates thin films used to achieve higher results. They are ideal for Integrated circuit processing in the semiconductor industry. To achieve the desired outcomes, it is made sure that these sputtering targets are used for not only the old-styled devices but also for the latest equipment

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