Silicon (Si) (undoped) Sputtering Targets
Silicon is a silvery looking substance with a molecular weight of 28.08 and a melting point of 1414 °C. It is rather a very useful element. It plays an important role in our daily life which is increasing at a rapid pace. Silicon sputtering targets are formed through thin-film depositions and are of high mechanical properties. Undoped sputtering targets are mainly utilized for electrical isolation because of their low conductivity. Its electrical resistivity is 3-4 microhm-cm @ 0°C. Due to their lightweight, non-toxic and inactive properties, they are extensively used for medical purposes. These targets are made with great care in modern laboratories using the latest technology to deliver accurate results. Undoped Silicon Sputtering Targets are available in many forms like discs and rods with different sizes to meet the customer's requirements. It is also ensured that the targets are made of the highest possible density and with the lowest grain size.