Magnesium Oxide Sputtering Targets

Magnesium Oxide Sputtering Targets

Magnesium Oxide which is also known as Magnesia Periclase is an inorganic chemical compound with the chemical formula MnO. The appearance of Magnesium Oxide is white and it has a density of 3.58/cm3, a melting point of 2,852° C (5,166° F) and a boiling point of 3,600° C (6,512° F). It is commonly used for sputtering targets to deposit a thin film for use in semiconductors and technological equipment. We use cutting edge technology to analyze targets with X-Ray Fluorescence (XRF) and Glow Discharge Mass Spectrometry (GDMS). The dimensions of targets are available in custom sizes for all types of new and old model sputter guns. If there is confusion regarding the correct size for your sputter gun, then contact us. Magnesium Oxide sputtering target is one of our most in-demand sputtering targets. With our ultra-modern technology, we provide high-quality Magnesium Oxide sputtering targets to satisfy the needs of our customers.

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