Silicon (Si (N-type)) Sputtering Target

Silicon (Si (N-type)) Sputtering Target

Silicon (N-type) has a molecular weight of 28.0885. It is a dark gray with a bluish tinge, semi-metallic substance. Its specifications include thermal conductivity of 150 W/m.K and melting point is 1,410 °C. Silicon N-type Sputtering Targets are produced using crystallization and sublimation. The thin-film depositions are achieved through ionic bombardment. All techniques are performed in a controlled environment to ensure 99.9% purity. Its applications have incredible impacts on solar cells, transistors, and semiconductors. These sputtering targets are also used for coating because of the temperature absorption ability. We specialize in providing several different shapes and sizes to guarantee the ultimate results. They are available in both standard and custom based requirements. We deliver on time and the packaging is properly labeled to ensure safety. We use padded packaging to ensure that the material is not damaged and special care is taken that it is not contaminated by a foreign substance.

  • Product
  • Qty in Cart
  • Quantity
  • Price
  • Subtotal