Zinc Oxide with Alumina Sputtering Targets

 Zinc Oxide with Alumina Sputtering Targets

Zinc Oxide with Alumina Sputtering Targets are solids in various forms. Aluminum-doped zinc oxide was first studied to replace indium-tin-oxide (ITO) because of the concerns over the indium's shortage and high price. Alumina doping was also investigated to expand the applications of zinc oxide targets. It has caught great attention all across the globe for the past few years because of its potential properties, comparatively less cost, and availability of its components. Moreover, the chemical properties of alumina-doped zinc oxide targets are also significant as compared to other conductive oxides, hence, making it a desirable compound for use in different applications. Now, zinc oxide with alumina sputtering targets can be used in touch screens, solar cells, semiconductors, chemical vapor deposition (CVD), physical vapor deposition (PVD), and many other optical sensors. The efficiency and effectiveness of these targets depend upon the degree of purity. We state with great delight that we offer 99.99% purity and various shapes and sizes.

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