Sputtering targets were first discovered in 1852. Since then the sputtering targets have been utilized for many purposes. Sputtering targets are a physical vapor deposition mechanism, which has a lot of uses in modern manufacturing and technology. In this process, a sputtering target is used to create a thin film by breaking the solid material into gaseous ions which coats other material like a spray, which is called a substrate. The process of sputtering can be repeated many times and can be scaled from production batches involving large or medium substrate batches to small development and research projects. With such high productivity, the demand for sputtering targets is rising in recent years. Some of its uses include glass coating, decorative coating, solar cell coating, and semiconductors. Apart from that, sputtering targets are utilized to strengthen the surface of molds and tools, which greatly enhances the life of molds and tools. The main types of sputtering targets used to coat tools are chromium, titanium, and aluminum.