Silicon Nitride Sputtering Targets

Silicon Nitride Sputtering Target's chemical formula is Si3N4 which is the type of nitride ceramic sputtering target. It has a high melting point of 1800°C ceramic material and a density of 2.2 to 3.5 g/cm3 that is extremely hard and relatively chemically inert. Silicon Nitride is obtained by heating the powder of silicon between 1300 °C and 1400 °C in the presence of nitrogen. Then this powdered Silicon Nitride can be turned into the designed shape. Its application as a thin film deposition is incredibly useful. Silicon nitride sputtering targets are used for CD-ROM, display, LED, decoration, semiconductor, and solar cells. It is also good at extreme temperatures and for that matter, it is used for functional coating in the space industry and glass coating industry. Several shapes such as rods, oval, discs, and plates are available according to the customer's requirement. We take great care in sending the shipment.