1 piece/835 €
Please contact us for quotes on larger quantities !!!
Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets
Purity: 99.9%, Size: 1'', Thickness: 0.250''
Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.
The process with sputter targets is repeatable and can be scaled up from small research and development projects. The proses with sputter
targets can be adapted to the production batches involving medium to large substrate areas. The chemical reaction can occur on the target
surface, in-flight or on the substrate depending on the process parameters. The many parameters make sputter deposition a complex process
but allow experts a large degree of control over the growth and microstructure of the area.
Applications of Sputtering Targets;
- Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering
that involves eroding material from a "target" source onto a "substrate" such as a silicon wafer.
- Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy
is needed and selectivity is not a concern.
- Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered,
the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the
target material can be determined and even extremely low concentrations of impurities are detected.
Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and
chemical properties of airless bodies, such as asteroids and the Moon.
Lead zirconium titanate is an inorganic compound. It is a ceramic perovskite material that shows a marked piezoelectric effect, meaning that the compound
changes shape when an electric field is applied. Lead zirconium titanate is used in a number of practical applications such as ultrasonic transducers and
The preparation of PZT thin film were soon discovered by many techniques such as sol-gel process , pulse laser deposition, radio frequency (RF) magnetron
sputter, and metal organic chemical vapour deposition (MOCVD)would also may affect the performance of electrical and structural properties thin films. In
addition, RF magnetron sputter is considered as reliable method compared to other because it produce uniformity and smooth surface of thin film.
have a high operating temperature. Due to its physical strength, chemical inertness, tailorability, and relatively inexpensive manufacture costs, it is one of the most commonly used piezo ceramics used in the industry.
Lead zirconium titanate is known has the highest dielectric constant among advanced ceramic material . This is due to its perovskite structure that exists in high orientation of lead zirconium titanate resulted to dielectric constant which is looking forward to improve the storage capability of capacitor. Instead of being a ferroelectric material provided by its perovskite structure, lead zirconium titanate also has large band gap which make it suitable as semiconductor material as well.
The preparation of PZT thin film were soon discovered by many techniques such as sol-gel process , pulse laser deposition, radio frequency (RF) magnetron sputter, and metal organic chemical vapour deposition (MOCVD)would also may affect the performance of electrical and structural properties thin films. In addition, RF magnetron sputter is considered as reliable method compared to other because it produce uniformity and smooth surface of thin film. To reach out more information about radio frequency (RF) magnetron sputter of lead zirconium titanate, you may go to the link given below: