Copper (Cu) Sputtering Targets, Purity: 99.99%, Size: 6'', Thickness: 0.125''
- Calculated at Checkout
1 piece/110 €
Please contact us for quotes on larger quantities !!!
Copper (Cu) Sputtering Targets
Purity: 99.99%, Size: 6'', Thickness: 0.125''
Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.
The process with sputter targets is repeatable and can be scaled up from small research and development projects. The proses with sputter
targets can be adapted to the production batches involving medium to large substrate areas. The chemical reaction can occur on the target
surface, in-flight or on the substrate depending on the process parameters. The many parameters make sputter deposition a complex process
but allow experts a large degree of control over the growth and microstructure of the area.
Applications of Sputtering Targets;
- Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering
that involves eroding material from a "target" source onto a "substrate" such as a silicon wafer.
- Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy
is needed and selectivity is not a concern.
- Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered,
the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the
target material can be determined and even extremely low concentrations of impurities are detected.
Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and
chemical properties of airless bodies, such as asteroids and the Moon.
General Overview of Copper:
Copper which has the chemical symbol of Cu is a reddish colored metal which is malleable and ductile. Copper has excellent thermal and electrical
conductivities and good corrosion resistance. Since copper has excellent electrical conductivity, it is used in electrical industry. Copper is used in
many important alloys.
Copper Sputtering Targets Applications:
Sputtering targets commonly used to coat electronic components and electronic instruments. Due to Copper's high electrical conductivity, it is becoming
increasingly popular for use in large-format, high-resolution TFT-LCD television sets. Copper is used as the electrode layer in thin-film transistors. The
copper layer controls the individual image dots (pixels) and therefore Copper determines the quality of the obtained image. Since Our Copper sputtering
targets have a particularly fine-grained microstructure, you benefit from uniform erosion and a low susceptibility to particle formation throughout the