Cobalt Iron Boron (Co-Fe-B) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''

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  • Cobalt Iron Boron (Co-Fe-B) Sputtering Targets, Purity: 99.9%, Size: 2'', Thickness: 0.250''
  • Cobalt Iron Boron (Co-Fe-B) Sputtering Targets, Size:2'' ,Thickness:0.250'' , Purity: 99.9%


1 piece/492 €  

Please contact us for quotes on larger quantities !!! 

Cobalt Iron Boron (Co-Fe-B) Sputtering Targets

Purity: 99.9%, Size: 2'', Thickness: 0.250'' 

Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.
The process with sputter targets is repeatable and can be scaled up from small research and development projects. The proses with sputter
targets can be adapted to the production batches involving medium to large substrate areas. The chemical reaction can occur on the target
surface, in-flight or on the substrate depending on the process parameters. The many parameters make sputter deposition a complex process 
but allow experts a large degree of control over the growth and microstructure of the area. 

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering
          that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy
          is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.

One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, 
the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the
target material can be determined and even extremely low concentrations of impurities are detected.

Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and 
chemical properties of airless bodies, such as asteroids and the Moon.

Cobalt, iron and boron get together to form an alloy and this alloy can be used as a sputtering target. Let’s look at the applications that cobalt, iron and
boron alloy can be used.

Boron alloy with transition metals like cobalt iron boron have many attractive properties, including high melting point and hardness, good wear and 
corrosion resistance, excellent electrical conductivity, and resistance to attack by molten metals. There therefore appears to be significant scope for 
enhancing surface properties of metals and ceramics by applying coatings constituted from these materials.

Also, there are many applications which require a high ultimate tensile strength, high thermal stability and ease of fabricability. All these properties can 
be obtained by using alloys. For example, metal ribbons used in razor blade applications usually undergo a heat treatment of about 370° C for about 
30 min to bond an applied coating of polytetrafluoroethylene to the metal. Likewise, metal strands used as tire cord undergo a heat treatment of about 
160° to 170° C. for about 1 hour to bond tire rubber to the metal.

Alloys of iron, cobalt and boron can be used for high mechanical hardness and soft magnetic properties. The magnetic properties of these amorphous 
metal alloys are also unusual. Because of the unusual combination of high mechanical hardness and the soft magnetic properties, these alloys are useful 
as transformer cores and toroids.

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