Chromium Oxide (Cr2O3) Sputtering Targets, Purity: 99.8%-99.9%, Size: 3'', Thickness: 0.250''

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1 piece/620 €  

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Chromium Oxide (Cr2O3) Sputtering Targets

Purity: 99.8%-99.9%, Size: 3'', Thickness: 0.250'' 

Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.
The process with sputter targets is repeatable and can be scaled up from small research and development projects. The proses with sputter
targets can be adapted to the production batches involving medium to large substrate areas. The chemical reaction can occur on the target
surface, in-flight or on the substrate depending on the process parameters. The many parameters make sputter deposition a complex process 
but allow experts a large degree of control over the growth and microstructure of the area. 

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering
          that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy
          is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.

One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, 
the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the
target material can be determined and even extremely low concentrations of impurities are detected.

Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and 
chemical properties of airless bodies, such as asteroids and the Moon. 

Chromium oxide is the inorganic compound of the formula Cr2O3. Chromium oxide sputtering targets are used in many applications. Not let’s look at 
some examples where chromium oxide sputtering targets are used. Cr2O3 thin films exhibit high hardness values and low friction coefficients. These 
properties make chromium oxide a serious candidate to replace transition metal nitrides or Al2O3 in special applications. 

Thin films of chromium oxide are an important material for a wide variety of optical and electrical applications. Many integrated circuit, flat panel 
display and optical devices require thin films of chromium oxide. 

Another study about chromium oxide sputtering targets is related with magnetic recording applications. Hard coatings are commonly used in magnetic 
heads and media for protection against corrosion and wear. Chromium oxide coatings have been developed for protection of the tape bearing surface of 
digital compact cassette (DCC) heads. 

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