Barium Fluoride (BaF2) Sputtering Targets, Purity: 99.99%, Size: 3'', Thickness: 0.125''

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Barium Fluoride (BaF2) Sputtering Targets

Purity: 99.99%, Size: 3'', Thickness: 0.125'' 

Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.
The process with sputter targets is repeatable and can be scaled up from small research and development projects. The proses with sputter
targets can be adapted to the production batches involving medium to large substrate areas. The chemical reaction can occur on the target
surface, in-flight or on the substrate depending on the process parameters. The many parameters make sputter deposition a complex process 
but allow experts a large degree of control over the growth and microstructure of the area. 

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering
          that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy
          is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.

One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, 
the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the
target material can be determined and even extremely low concentrations of impurities are detected.

Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and 
chemical properties of airless bodies, such as asteroids and the Moon. 

Barium fluoride (BaF2) is a chemical compound of barium and fluorine and is a salt. It is a solid which can be a transparent crystal. Barium fluoride is a
chemical compound for the 10 to 20µm wavelength infrared region. Barium fluoride is used in aluminium-metallurgy, enamel and glazing frits production
and the production of welding agents. In aluminum-metallurgy, barium fluoride is used as additive in aluminum refining process. When we look at the 
surface treatment in aluminum industry, we see that bright reflective surface on the aluminum is achieved by chemical polishing. Inorganic fluorides like 
barium fluoride are also of critical importance in the flux brazing of aluminum and aluminum alloys, acting to remove the oxide layer.


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