Barium (Ba) Sputtering Targets, Purity: 99.5%, Size: 4'', Thickness: 0.250''

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Barium (Ba) Sputtering Targets

Purity: 99.5%, Size: 4'', Thickness: 0.250'' 

Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.
The process with sputter targets is repeatable and can be scaled up from small research and development projects. The proses with sputter
targets can be adapted to the production batches involving medium to large substrate areas. The chemical reaction can occur on the target
surface, in-flight or on the substrate depending on the process parameters. The many parameters make sputter deposition a complex process 
but allow experts a large degree of control over the growth and microstructure of the area. 

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering
          that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy
          is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.

One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, 
the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the
target material can be determined and even extremely low concentrations of impurities are detected.

Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and 
chemical properties of airless bodies, such as asteroids and the Moon.  

Barium with the atomic symbol of Ba and atomic number of 56 is a Block S, Group 2, Period 6 element with an atomic weight of 137.27. Barium is a
member of the alkaline-earth metals. Barium sputtering targets can be for plating of electronic devices. Barium has good electrical properties and
these properties make it useful for sputtering applications. For semiconductors barium sputtering targets can be used. For flat panel displays barium
sputtering targets will be a good choice. Barium can make alloys with other metals like strontium and titanium and gain more specific properties
especially when these alloys are used for sputtering. You can find many researches about barium and its alloys where they are used as sputtering targets.

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