Antimony Telluride (Sb2Te3) Sputtering Targets, Purity: 99.999%, Size: 3'', Thickness: 0.125''

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  • Antimony Telluride (Sb2Te3) Sputtering Targets, Size:3'' ,Thickness: 0.125'' , Purity: 99.999%
  • Antimony Telluride (Sb2Te3) Sputtering Targets, Size:3'' ,Thickness: 0.125'' , Purity: 99.999%


1 piece/945 € 

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Antimony Telluride (Sb2Te3) Sputtering Targets

Purity: 99.999%, Size: 3'', Thickness: 0.125''  

Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.
The process with sputter targets is repeatable and can be scaled up from small research and development projects. The proses with sputter
targets can be adapted to the production batches involving medium to large substrate areas. The chemical reaction can occur on the target
surface, in-flight or on the substrate depending on the process parameters. The many parameters make sputter deposition a complex process 
but allow experts a large degree of control over the growth and microstructure of the area. 

Applications of Sputtering Targets;

  • Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering
          that involves eroding material from a "target" source onto a "substrate" such as  a silicon wafer.
  • Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy
          is needed and selectivity is not a concern.
  • Sputter targets is also used for analysis by etching away the target material.

One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered, 
the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the
target material can be determined and even extremely low concentrations of impurities are detected.

Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and 
chemical properties of airless bodies, such as asteroids and the Moon.  

Antimony telluride is an inorganic compound with the chemical formula Sb2Te3. It is a grey crystalline solid with layered structure. Layers consist of 
two atomic sheets of antimony and three atomic sheets of tellurium and are held together by weak van der Waals forces. 

Now let’s look at the application areas of antimony telluride sputtering targets. As all we know thermoelectric devices have attracted much attention for 
application as power generators, coolers, and thermal sensors or detectors due to their ability to interconvert heat and electric energy directly. The 
performance of thermoelectric devices is evaluated by the materials’ dimensionless figure of merit (ZT) or the power factor. Antimony tellurium (Sb2Te3)
is a well-established thermoelectric material that is used in the temperature range of 200 K to 400 K due to its good electrical conductivity. Antimony 
telluride sputtering targets can be used for coating of flexible materials.

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