Sputtering Targets
As a leading supplier of high-quality nanomaterials and nanotechnology-based products, Nanografi offers a wide range of sputtering targets for various applications.
Sputtering targets are a physical vapor deposition mechanism that have a multitude of uses in modern manufacturing and technology. The process involves breaking solid materials into gaseous ions which coat other materials, creating a thin film. Sputtering can be scaled for large production batches or small research projects. With high productivity and versatility, the demand for sputtering targets has increased in recent years.
At Nanografi, we offer sputtering targets for applications such as glass coating, decorative coating, solar cell coating, and semiconductors. We also provide targets for strengthening the surfaces of molds and tools, including chromium, titanium, and aluminum.
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Iron Oxide (Fe3O4) Sputtering Targets, indium, Purity: 99.9%, Size: 1'', Thickness: 0.125''
€741.001 piece/404 € Please contact us for quotes on larger quantities !!! Iron Oxide (Fe3O4) Sputtering Targets, indium Purity: 99.9%, Size: 1'', Thickness: 0.125'' Sputtering is a proven technology capable of...NG0ST01FE30€741.00