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Barium Strontium Titanate (BaO4SrTi) Sputtering Targets, elastomer
Purity: 99.99%, Size: 8'', Thickness: 0.250''
Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes.
The process with sputter targets is repeatable and can be scaled up from small research and development projects. The proses with sputter
targets can be adapted to the production batches involving medium to large substrate areas. The chemical reaction can occur on the target
surface, in-flight or on the substrate depending on the process parameters. The many parameters make sputter deposition a complex process
but allow experts a large degree of control over the growth and microstructure of the area.
Applications of Sputtering Targets;
- Sputtering targets is used for film deposition. The deposition made by sputter targets is a method of depositing thin films by sputtering
that involves eroding material from a "target" source onto a "substrate" such as a silicon wafer.
- Semiconductor sputtering targets is used to etch the target. Sputter etching is chosen in cases where a high degree of etching anisotropy
is needed and selectivity is not a concern.
- Sputter targets is also used for analysis by etching away the target material.
One of the example occurs in secondary ion spectroscopy (SIMS), where the target sample is sputtered at a constant rate. As the target is sputtered,
the concentration and identity of sputtered atoms are measured using mass spectrometry. By helping of the sputtering target, the composition of the
target material can be determined and even extremely low concentrations of impurities are detected.
Sputtering target has also application area in space. Sputtering is one of the forms of space weathering, a process that changes the physical and
chemical properties of airless bodies, such as asteroids and the Moon.
Barium strontium titanate (BST) is a solid solution of barium titanate (BaTiO3) and strontium titanate (SrTiO3). Barium strontium titanate (BST) thin
films obtained by sputtering methods gives excellent dielectric properties to materials. Because of this, barium strontium titanate (BST) based
ferroelectric thin film devices have been popular over the last decade due to their versatile applications in tunable microwave devices such as delay lines,
resonators, phase shifters, and varactors.
Barium strontium titanate thin films are promising candidates due to their high dielectric constant, tunability and low dielectric loss. Dielectric-tunable
properties of barium strontium titanate films deposited by different deposition techniques have been reported which study the effects of factors, such as
oxygen vacancies, film thickness, grain size, Ba/Sr ratio, etc. Researchers have also studied doping concentrations, high temperature annealing and
multilayer structures to attain higher tunability and lower loss.